Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
Main products:High Purity Metal:Al,Ag,Au,Bi,Co,Cr,Cu,Fe, Hf,Mg,Mn,Mo,Nb,Ni,Pb,Pd,In,Si,Sn,Ta,Ti,Zn,Zr,W targets and Evaporation material. Ceramic targets: Nb205, Ta205, ITO, SnO2, ZnO, Al2O3, AZO, GeS and TiO2,Ti2O3,Ti3O5 Precions Metal: Au, Ag, Pt, Pd, Ru, Rh and I
Products
Contact Us
  • Contact Person : Ms. Zhao Alice
  • Company Name : Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
  • Tel : 86-10-82830276
  • Fax : 86-10-62923013
  • Address : Beijing,Beijing,Room1235,QingHeJiaYuan East Area armor 1st,Haidian District,Beijing,China
  • Country/Region : China
  • Zip : 100085

High purity Copper sputtering target 99.995%~99.9999%

High purity Copper sputtering target 99.995%~99.9999%
Product Detailed
1. High density 2. Low impurity content 3. Microstructure:Uniform 4. Surface: Machine plane / Polished 5. ISO9001: 2008

Item Name

High purity copper (Cu) target

Purity

99.995%~99.9999%

Shape

Flat/rotary target, according to your request

Available size

Round: dia 25~300mm,Thickness:3~10mm

Rectangular: Length up to 1500mm

Customization is available

Certificates

ISO9001:2008, SGS, The third test report

Technics

Vacuum Melting, Patented thermo-mechanical process

Application

Widely used in coating processing industries

A: Solar Photovoltaic Appication.

B: Electronic and Semiconductor Appication.

C: Decoration and Coating Appication. etc.

 

                                              Quality Standard (99.995% Cu)

Element

Value(≤ppm)

Element

Value(≤ppm)

P

1

Ni

1

Bi

1

Pb

1

Sb

1

Sn

1

As

1

S

1

Fe

2

O

20

Zn

1

                                             Quality Standard (99.9999% Cu)

Element

Value(≤ppm)

Element

Value(≤ppm)

Ag

0.5

Ni

0.05

Al

0.3

P

0.02

As

0.02

Pb

0.01

Bi

0.02

Si

0.3

Ca

0.1

Sn

0.05

Cd

0.1

Th

0.001

Cl

0.1

Ti

0.3

Cr

0.05

U

0.001

Fe

0.1

V

0.05

Ga

0.05

Zn

0.2

K

0.02

C

20

Li

0.02

S

5

Mg

0.2

O

10

Mn

0.05

N

1

Na

0.02

 

 

High purity Copper sputtering target 99.995%~99.9999%



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