Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
Main products:High Purity Metal:Al,Ag,Au,Bi,Co,Cr,Cu,Fe, Hf,Mg,Mn,Mo,Nb,Ni,Pb,Pd,In,Si,Sn,Ta,Ti,Zn,Zr,W targets and Evaporation material. Ceramic targets: Nb205, Ta205, ITO, SnO2, ZnO, Al2O3, AZO, GeS and TiO2,Ti2O3,Ti3O5 Precions Metal: Au, Ag, Pt, Pd, Ru, Rh and I
Products
Contact Us
  • Contact Person : Ms. Zhao Alice
  • Company Name : Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
  • Tel : 86-10-82830276
  • Fax : 86-10-62923013
  • Address : Beijing,Beijing,Room1235,QingHeJiaYuan East Area armor 1st,Haidian District,Beijing,China
  • Country/Region : China
  • Zip : 100085

High purity Aluminum (Al) sputtering target 99.999%, 99.9995%

High purity Aluminum (Al) sputtering target 99.999%, 99.9995%
Product Detailed
1. High density 2. Low impurity content 3. Microstructure:Uniform 4. Surface: machine plane / polished 5. ISO9001: 2008

Item Name

High purity aluminium (Al) target

Purity

99.999%, 99.9995%

Shape

Flat/rotary target, according to your request

Available size

Round: dia 25~300mm,Thickness:3~10mm

Rectangular: Length up to 1500mm

Customization is available

Certificates

ISO9001:2008, SGS, The third test report

Technics

Vacuum Melting, Patented thermo-mechanical process

Application

Widely used in coating processing industries

A: Solar Photovoltaic Appication.

B: Electronic and Semiconductor Appication.

C: Decoration and Coating Appication. etc.

 

 

                       

Quality Standard (99.999% Al)

Element

Value(≤ppm)

Element

Value(≤ppm)

Element

Value(≤ppm)

Li

0.05

Ca

0.05

Zr

0.05

Be

0.05

Ti

0.5

Ag

0.05

B

0.05

V

0.5

In

0.05

Na

0.05

Th

0.01

Sn

0.05

Mg

2.5

Cr

0.5

W

0.05

Si

2.3

Mn

0.2

Hg

0.05

P

0.05

Fe

1.5

U

0.01

S

0.05

Ni

0.2

Cr

0.5

Cl

0.05

Cu

1.5

K

0.02

Zn

0.2

Quality Standard (99.9995% Al)

Element

Value(≤ppm)

Element

Value(≤ppm)

Element

Value(≤ppm)

Li

<0.05

Ca

<0.05

Zr

<0.05

Be

<0.05

Ti

0.069

Ag

<0.05

B

<0.05

V

0.078

In

<0.05

Na

<0.05

Pb

<0.05

Sn

<0.05

Mg

0.911

Cr

0.051

W

<0.05

Si

0.715

Mn

0.062

Hg

<0.05

P

<0.05

Fe

0.385

Ce

<0.01

S

<0.05

Ni

0.057

Th

<0.001

Cl

<0.05

Cu

0.694

U

<0.001

K

<0.02

Zn

0.071

High purity Aluminum (Al) sputtering target 99.999%, 99.9995%



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